IBM Develops Technology To Keep Chips Evolving
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As the computer industry develops at an ever-increasing rate, the future might look grim, because at some point the current rate of miniaturization and chip development might come to an end and other, more expensive solutions, will have to be found, as the technology reaches the boundary imposed by the known laws of physics. However, it seems that IBM researchers have found a way to overcome this problem, as they have announced the discovery of a way to extend a key chip-manufacturing process to generate smaller chip circuits.
IBM scientists have created the smallest, high-quality line patterns ever made using deep-ultraviolet (DUV, 193-nanometer) optical lithography -- a technology currently used to essentially 'print' circuits on chips. The distinct and uniformly spaced ridges are only 29.9 nanometers wide (a nanometer is a billionth of a meter). This is less than one-third the size of the 90-nanometer features now in mass production and below the 32 nanometers that industry consensus held as the limit for optical lithography techniques.
As the computer industry develops at an ever-increasing rate, the future might look grim, because at some point the current rate of miniaturization and chip development might come to an end and other, more expensive solutions, will have to be found, as the technology reaches the boundary imposed by the known laws of physics. However, it seems that IBM researchers have found a way to overcome this problem, as they have announced the discovery of a way to extend a key chip-manufacturing process to generate smaller chip circuits.IBM scientists have created the smallest, high-quality line patterns ever made using deep-ultraviolet (DUV, 193-nanometer) optical lithography -- a technology currently used to essentially 'print' circuits on chips. The distinct and uniformly spaced ridges are only 29.9 nanometers wide (a nanometer is a billionth of a meter). This is less than one-third the size of the 90-nanometer features now in mass production and below the 32 nanometers that industry consensus held as the limit for optical lithography techniques.
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